The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2019
Filed:
Jul. 29, 2016
Massachusetts Institute of Technology, Cambridge, MA (US);
Neal Wadhwa, Cambridge, MA (US);
Tali Dekel, Cambridge, MA (US);
Donglai Wei, Arlington, MA (US);
Frederic Pierre Durand, Somerville, MA (US);
William T. Freeman, Acton, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
Geometries of the structures and objects deviate from their idealized models, while not always visible to the naked eye. Embodiments of the present invention reveal and visualize such subtle geometric deviations, which can contain useful, surprising information. In an embodiment of the present invention, a method can include fitting a model of a geometry to an input image, matting a region of the input image according to the model based on a sampling function, generating a deviation function based on the matted region, extrapolating the deviation function to an image wide warping field, and generating an output image by warping the input image according to the warping. In an embodiment of the present invention, Deviation Magnification inputs takes a still image or frame, fits parametric models to objects of interest, and generates an output image exaggerating departures from ideal geometries.