The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2019
Filed:
Dec. 09, 2015
Covestro Deutschland Ag, Leverkusen, DE;
Thomas Rölle, Leverkusen, DE;
Horst Berneth, Leverkusen, DE;
Friedrich-Karl Bruder, Krefeld, DE;
Dennis Hönel, Zülpich-Wichterich, DE;
Serguei Kostromine, Swisttal-Buschhoven, DE;
Thomas Fäcke, Leverkusen, DE;
Covestro Deutschland AG, Leverkusen, DE;
Abstract
The invention relates to naphthyl urethane acrylates particularly useful as writing monomers in photopolymer formulations for holographic media. The invention further relates to a photopolymer formulation comprising matrix polymers, writing monomers and photoinitiators, wherein the writing monomers comprise a naphthyl urethane acrylate according to the invention, to a holographic medium comprising matrix polymers, writing monomers and photoinitiators, wherein the writing monomers comprise a naphthyl urethane acrylate according to the invention, and also to a display comprising a holographic medium according to the invention.