The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2019
Filed:
Feb. 03, 2017
Applicant:
Agc Inc., Chiyoda-ku, JP;
Inventor:
Hiroshi Hanekawa, Chiyoda-ku, JP;
Assignee:
AGC Inc., Chiyoda-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/24 (2012.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 1/24 (2013.01); H01L 21/0332 (2013.01); H01L 21/0337 (2013.01);
Abstract
To provide a reflective mask blank having pseudo defects significantly excluded. The reflective mask blank comprises a substrate, a reflective layer for reflecting EUV light, formed on the substrate, and an absorber layer for absorbing EUV light, formed on the reflective layer, wherein S<1.0 is satisfied, where Sis skewness in a region of 1 μm×1 μm on the absorber layer side surface.