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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10241339 B1

PDFFull Text
Date of Patent:
Mar. 26, 2019

Filed:

Jun. 30, 2016

Laser pulse delay system and laser annealing system

Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Xiaowei Xu, Beijing, CN;

Xiaolong Li, Beijing, CN;

Liangjian Li, Beijing, CN;

Assignee:

BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;

Attorney:

Calfee, Halter & Griswold LLP

Primary Examiner:

Loha Ben

Int. Cl.
CPC ...
G02B 27/14 (2006.01); G02B 27/10 (2006.01); G02B 26/02 (2006.01); B23K 26/00 (2014.01); B23K 26/067 (2006.01); B23K 26/0622 (2014.01); H01L 21/268 (2006.01); B23K 26/06 (2014.01); H01S 3/00 (2006.01); B23K 103/00 (2006.01); H01S 3/10 (2006.01); G02B 17/02 (2006.01);
U.S. Cl.
CPC ...
G02B 27/144 (2013.01); B23K 26/0006 (2013.01); B23K 26/067 (2013.01); B23K 26/0622 (2015.10); B23K 26/0643 (2013.01); G02B 26/02 (2013.01); G02B 27/106 (2013.01); H01L 21/268 (2013.01); H01S 3/0057 (2013.01); B23K 2103/56 (2018.08); G02B 17/023 (2013.01); H01S 3/10 (2013.01);
Abstract

The present disclosure discloses a laser pulse delay system and a laser annealing system. The laser pulse delay system comprises: a beam splitter, a first reflective unit and a delay unit. The beam splitter is configured to split a laser beam emitted by a laser into a first beam and a second beam, such that the first beam is transmitted to the first reflective unit and the second beam is transmitted to the delay unit. The first reflective unit is configured to reflect the first beam it receives, such that the reflected first beam is transmitted to a component to be irradiated. The delay unit is configured to delay the second beam it receives, such that the delayed second beam is transmitted to the component to be irradiated.

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