The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2019
Filed:
May. 09, 2016
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Zhen Dai, Urbana, IL (US);
Thomas J. Houlahan, Urbana, IL (US);
J. Gary Eden, Champaign, IL (US);
Sung-Jin Park, Champaign, IL (US);
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Abstract
The invention provides methods and systems for water dissociation with microplasma generated in microchannel plasma arrays or chips. Preferred methods and systems introduce water vapor into a microchannel plasma array. Electrical power is applied to the microchannel plasma array to create a plasma chemical reaction of the water vapor in the microchannel plasma array. Dissociated hydrogen and/or oxygen gas is collected at an output of the microchannel plasma array. The water vapor can be entrained in a carrier gas, but is preferably introduced without carrier gas. Direct introduction of water vapor has been demonstrated to provide efficiencies at an above 60%. The use of carrier gas reduces efficiency, but still exceeds efficiencies of prior methods discussed in the background.