The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2019

Filed:

Apr. 26, 2016
Applicant:

Advanced Micro-fabrication Equipment Inc. Shanghai, Shanghai, CN;

Inventors:

Zhiyou Du, Shanghai, CN;

Peijin Xing, Shanghai, CN;

Wenyuan Fan, Shanghai, CN;

Yinxin Jiang, Shanghai, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); C23C 16/4407 (2013.01);
Abstract

A chemical vapor deposition apparatus includes: a reaction chamber, a reaction area in the upper portion of the reaction chamber, an exhaust area in the bottom portion of the reaction chamber and a pumping apparatus connected to the outside of the reaction chamber. The exhaust area includes an isolating device dividing the exhaust area into an exhaust chamber and a storage chamber. The isolating device has a sidewall with gas openings connecting the exhaust chamber and the storage chamber. The exhaust area further includes a scraping component that can move up and down between the upper end and the lower end of the gas openings.


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