The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2019

Filed:

Aug. 06, 2015
Applicant:

Imperial Innovations Limited, London, GB;

Inventors:

Marc Shaepertoens, London, GB;

Piers Robert James Gaffney, London, GB;

Gyorgy Szekely, London, GB;

Andrew Guy Livingston, London, GB;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K 47/60 (2017.01); B01D 61/00 (2006.01); C08G 65/30 (2006.01); C08G 65/46 (2006.01); C08G 65/329 (2006.01);
U.S. Cl.
CPC ...
C08G 65/30 (2013.01); A61K 47/60 (2017.08); B01D 61/00 (2013.01); C08G 65/329 (2013.01); C08G 65/46 (2013.01); B01D 2315/16 (2013.01); C08G 2650/30 (2013.01); C08G 2650/38 (2013.01); C08G 2650/50 (2013.01); C08G 2650/64 (2013.01); C08L 2203/02 (2013.01);
Abstract

A process for preparing non-naturally-occurring defined monomer sequence polymers is provided, and in which a high degree of synthetic control is obtained by the use of solvent resistant diafiltration membranes. Also provided is a process for separating non-naturally-occurring defined monomer sequence polymers from synthetic by-products or excess reagents using solvent resistant diafiltration membranes, and a use of a solvent resistant diafiltration membrane in processes for preparing and separating non-naturally-occurring defined monomer sequence polymers.


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