The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2019
Filed:
Feb. 22, 2017
Applicant:
Board of Regents the University of Texas System, Austin, TX (US);
Inventors:
Carlton Grant Willson, Austin, TX (US);
Gregory Blachut, Austin, TX (US);
Michael Maher, Austin, TX (US);
Yusuke Asano, Austin, TX (US);
Christopher John Ellison, Austin, TX (US);
Assignee:
Board of Regents The University of Texas System, Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 297/00 (2006.01); B32B 5/16 (2006.01); B05D 3/10 (2006.01); B05D 7/26 (2006.01); B05D 7/00 (2006.01); C09D 153/00 (2006.01); G03F 7/00 (2006.01); H01L 21/027 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
C08F 297/00 (2013.01); B05D 3/108 (2013.01); B05D 7/26 (2013.01); B05D 7/542 (2013.01); C09D 153/00 (2013.01); G03F 7/0002 (2013.01); H01L 21/0271 (2013.01); B81C 2201/0149 (2013.01); B82Y 40/00 (2013.01);
Abstract
The present invention relates to a method for the synthesis and utilization of block copolymer can that form sub-10 nm lamella nanostructures. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.