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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10239177 B1

PDFFull Text
Date of Patent:
Mar. 26, 2019

Filed:

Jun. 07, 2017

Metrological apparatus and method for adjusting the attitude of a rotation-symmetrical workpiece

Applicant:

Carl Mahr Holding Gmbh, Göttingen, DE;

Inventors:

Axel Wiegmann, Eisenberg, DE;

Stefan Mika, Jena, DE;

Ralf Kurch, Erfurt, DE;

Assignee:

Carl Mahr Holding GmbH, Goettingen, DE;

Attorney:

Fitch, Even, Tabin & Flannery LLP

Primary Examiner:

G Bradley Bennett

Int. Cl.
CPC ...
B23Q 17/22 (2006.01); G01B 5/004 (2006.01); G01B 11/00 (2006.01); B23Q 1/44 (2006.01); B23Q 17/20 (2006.01); G01B 21/04 (2006.01); G01M 11/02 (2006.01); G01B 5/00 (2006.01); G01B 5/20 (2006.01); G01B 5/25 (2006.01); G02B 27/62 (2006.01);
U.S. Cl.
CPC ...
B23Q 17/22 (2013.01); B23Q 1/44 (2013.01); B23Q 17/20 (2013.01); G01B 5/0002 (2013.01); G01B 5/004 (2013.01); G01B 5/20 (2013.01); G01B 5/25 (2013.01); G01B 11/002 (2013.01); G01B 21/045 (2013.01); G01B 21/047 (2013.01); G01M 11/025 (2013.01); G02B 27/62 (2013.01);
Abstract

A metrological apparatus () is disposed for adjustment of an attitude of a workpiece () having an arcuate upper surface () relative to a rotary axis (C) of the metrological apparatus (). The workpiece () is brought into a first rotary position (c). A plurality of measured points within a measuring plane on the upper surface () is recorded. The workpiece () is moved into a further rotary position (c) about the rotary axis (C), and again measured points in the measuring plane (E) on the upper surface () of the workpiece () are recorded. Based on these recorded measured points, the actual attitude (Li) of the workpiece () deviation from a specified target attitude (Ls) are determined. Adjustment parameters are determined, and an adjustment assembly () of the metrological apparatus () is activated as a function of the calculated adjustment parameters to adjust the workpiece ().

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