The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2019

Filed:

Aug. 16, 2017
Applicant:

GM Global Technology Operations Llc, Detroit, MI (US);

Inventors:

Smuruthi Kamepalli, Rochester, MI (US);

Balasubramanian Lakshmanan, Rochester Hills, MI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); H01M 8/021 (2016.01); C23C 16/46 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01); H01M 8/1018 (2016.01);
U.S. Cl.
CPC ...
H01M 8/021 (2013.01); C23C 16/455 (2013.01); C23C 16/46 (2013.01); C23C 16/52 (2013.01); H01M 2008/1095 (2013.01);
Abstract

A method for manufacturing a coated metal substrate includes the steps of: (1) inserting a substrate with a chromium(III) oxide layer inside a CVD chamber; (2) heating the substrate to a temperature which falls in the range of 400 to 500 degrees Celsius; (3) transporting gaseous nitrogen (N) and tantalum chloride (TaCl5) into the CVD chamber for at least two cycles; (4) ceasing the transportation of tantalum chloride (TaCl5) while nitrogen continues to flow from the inlet to the outlet; (5) reacting the tantalum chloride and the chromium(III) oxide and creating by-products; and (6) vacuuming the by-product matter from the CVD chamber via the flowing nitrogen gas.


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