The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2019

Filed:

Jul. 06, 2017
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Jagar Singh, Clifton Park, NY (US);

Shiv Kumar Mishra, Mechanicville, NY (US);

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/02 (2006.01); H01L 29/737 (2006.01); H01L 29/10 (2006.01); H01L 29/08 (2006.01); H01L 29/165 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 21/266 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7371 (2013.01); H01L 21/02381 (2013.01); H01L 21/02532 (2013.01); H01L 29/0688 (2013.01); H01L 29/0692 (2013.01); H01L 29/0817 (2013.01); H01L 29/0821 (2013.01); H01L 29/1004 (2013.01); H01L 29/1095 (2013.01); H01L 29/165 (2013.01); H01L 21/266 (2013.01); H01L 29/66681 (2013.01); H01L 29/7816 (2013.01);
Abstract

A device includes a substrate, a first well doped with dopants of a first conductivity type defined in the substrate, and a second well doped with dopants of a second conductivity type different than the first conductivity type defined in the substrate adjacent the first well to define a PN junction. The second well includes a silicon alloy portion displaced from the PN junction. A collector region contacts one of the first or second wells and has a dopant concentration higher than its contacted well. An emitter region contacts the other of the first or second wells and is doped with dopants of the first or second conductivity type different than the first or second well contacted by the emitter region. A base region contacts the other of the first or second well and has a dopant concentration higher than the first or second well contacted by the base region.


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