The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2019
Filed:
Jun. 16, 2016
Applicant:
Infineon Technologies Ag, Neubiberg, DE;
Inventor:
Manfred Engelhardt, Villach-Landskron, AT;
Assignee:
INFINEON TECHNOLOGIES AG, Neubiberg, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); C23C 16/509 (2006.01); C23C 14/34 (2006.01); C23C 16/50 (2006.01); H01L 21/02 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68785 (2013.01); C23C 14/34 (2013.01); C23C 16/4401 (2013.01); C23C 16/4583 (2013.01); C23C 16/50 (2013.01); C23C 16/5096 (2013.01); H01L 21/02274 (2013.01); H01L 21/3065 (2013.01); H01L 21/67069 (2013.01); H01L 21/6838 (2013.01);
Abstract
The semiconductor processing system includes a reactor chamber that has an upper wall and a lower wall. A hold member is disposed in the reactor chamber to hold a semiconductor substrate in such a way that it faces the lower wall of the reactor chamber.