The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2019

Filed:

Jul. 10, 2015
Applicant:

Essilor International (Compagnie Generale D'optique), Charenton le Pont, FR;

Inventor:

Olivier Beinat, Charenton le Pont, FR;

Assignee:

ESSILOR INTERNATIONAL, Charenton le Pont, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C23C 14/24 (2006.01); C23C 14/08 (2006.01); C23C 14/22 (2006.01);
U.S. Cl.
CPC ...
C23C 14/243 (2013.01); C23C 14/08 (2013.01); C23C 14/221 (2013.01); C23C 14/24 (2013.01);
Abstract

Disclosed is a process of physical vapor deposition of a material layer on surfaces of a plurality of substrates (), wherein the plurality of substrates () are arranged on a dome () which rotates according to a dome rotation axis (); the material to be deposited is vacuum evaporated thanks to an energy beam from a target (); the energy beam interacts with a beam impact surface of the target chosen within the list consisting of a part of a main surface () and a part of an edge () of the target and wherein the material diffuses from the target to the substrates around a main diffusion axis () which intersects the dome () at an intersection point, I; and the angle α between the dome rotation axis () and the main diffusion axis () is chosen within the ranges of +5° to +40° or −5° to −40°.


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