The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2019

Filed:

Jan. 07, 2015
Applicant:

United Technologies Corporation, Farmington, CT (US);

Inventors:

Joseph A. DePalma, Feeding Hills, MA (US);

Mladen F. Trubelja, Manchester, CT (US);

David A. Litton, West Hartford, CT (US);

Dmitri L. Novikov, Avon, CT (US);

Sergei F. Burlatsky, West Hartford, CT (US);

Assignee:

UNITED TECHNOLOGIES CORPORATION, Farmington, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/02 (2006.01); C23C 14/22 (2006.01); C23C 14/08 (2006.01); C23C 14/30 (2006.01); C23C 14/24 (2006.01);
U.S. Cl.
CPC ...
C23C 14/228 (2013.01); C23C 14/02 (2013.01); C23C 14/083 (2013.01); C23C 14/243 (2013.01); C23C 14/30 (2013.01);
Abstract

A method for use in a coating process includes pre-heating a substrate in the presence of a coating material and shielding the substrate during the pre-heating from premature deposition of the coating material by establishing a gas screen between the substrate and the coating material. An apparatus for use in a coating process includes a chamber, a crucible that is configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible. A second manifold provides gas during a later coating deposition to compress a vapor plume of the coating material and focus the plume on the substrate to increase deposition rate.


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