The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2019

Filed:

Dec. 22, 2017
Applicant:

Shin-etsu Chemical Co., Ltd., Chiyoda-ku, Tokyo, JP;

Inventors:

Kazuki Kikuchi, Joetsu, JP;

Mitsuhiro Yoshida, Joetsu, JP;

Junichi Matsubara, Joetsu, JP;

Tatsuya Yamashita, Joetsu, JP;

Akira Kitamura, Joetsu, JP;

Naosuke Maruyama, Joetsu, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08B 13/00 (2006.01); C09D 7/20 (2018.01); C09D 101/32 (2006.01); C09D 7/65 (2018.01);
U.S. Cl.
CPC ...
C08B 13/00 (2013.01); C09D 7/20 (2018.01); C09D 7/65 (2018.01); C09D 101/32 (2013.01);
Abstract

Provided are hypromellose acetate succinate (HPMCAS) which exhibits high solubility and can suppress generation of undissolved materials when dissolved in a solvent; an HPMCAS-containing composition; and a method for producing the HPMCAS. More specifically, provided are HPMCAS having a ratio of 2-position MS to 3-position MS of 1.2 or less, wherein the 2-position MS means a molar substitution of hydroxypropyl group by which a hydrogen atom of a hydroxyl group on 2-position carbon of each glucose unit of the HPMCAS has been directly replaced, and the 3-position MS means a molar substitution of hydroxypropyl group by which a hydrogen atom of a hydroxyl group on 3-position carbon of each glucose unit of the HPMCAS has been directly replaced; a composition comprising the HPMCAS and a solvent; and the method for producing the HPMCAS.


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