The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2019

Filed:

Jun. 25, 2014
Applicant:

Joled Inc., Tokyo, JP;

Inventors:

Eiji Takeda, Osaka, JP;

Toru Saito, Tokyo, JP;

Assignee:

JOLED INC., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 27/04 (2006.01); H01L 29/786 (2006.01); H01L 21/66 (2006.01); G01R 31/26 (2014.01); G01R 31/265 (2006.01); H01L 21/477 (2006.01); H01L 29/24 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78693 (2013.01); G01R 31/2621 (2013.01); G01R 31/2642 (2013.01); G01R 31/2656 (2013.01); H01L 21/477 (2013.01); H01L 22/14 (2013.01); H01L 29/247 (2013.01); H01L 29/66969 (2013.01); H01L 29/78606 (2013.01); H01L 29/78696 (2013.01); H01L 21/02554 (2013.01); H01L 21/02565 (2013.01); H01L 21/02631 (2013.01);
Abstract

A method of evaluating a thin-film transistor (TFT) which is disposed on a substrate, and includes at least: an oxide semiconductor layer which functions as a channel layer; and a channel protection layer disposed above the oxide semiconductor layer. The method includes: measuring a change in a reflectance of a microwave emitted to the oxide semiconductor layer while the oxide semiconductor layer is irradiated with excitation light by pulse irradiation; calculating a decay period which is a period of time taken for the reflectance to decay to 1/e or 1/e, based on the change in the reflectance obtained in the measuring; and performing determination related to a threshold voltage of the oxide semiconductor layer, based on the decay period calculated in the calculating.


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