The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2019

Filed:

Oct. 26, 2012
Applicant:

Panasonic Corporation, Osaka, JP;

Inventors:

Tomohiro Okumura, Osaka, JP;

Hiroshi Kawaura, Kanagawa, JP;

Tetsuya Yukimoto, Chiba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H05H 1/30 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
H01J 37/321 (2013.01); H01J 37/32357 (2013.01); H05H 1/30 (2013.01); H01L 21/3065 (2013.01);
Abstract

A plasma processing apparatus has a circular chamber having an opening portion which serves as a plasma ejection port surrounded by a dielectric member, a gas supply pipe for introducing gas into the inside of the chamber, a coil provided in the vicinity of the chamber, a high-frequency power supply connected to the coil, and a base material mounting table.


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