The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2019

Filed:

Jul. 02, 2015
Applicant:

Nanotech Analysis S.r.l., Turin, IT;

Inventors:

Gianpiero Mensa, Turin, IT;

Raffaele Correale, Turin, IT;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 27/00 (2006.01); H01J 37/08 (2006.01); F16K 99/00 (2006.01); H01J 27/20 (2006.01); H01J 37/18 (2006.01);
U.S. Cl.
CPC ...
H01J 37/08 (2013.01); F16K 99/0005 (2013.01); F16K 99/0028 (2013.01); F16K 99/0042 (2013.01); H01J 27/205 (2013.01); H01J 37/18 (2013.01); H01J 2237/006 (2013.01); H01J 2237/182 (2013.01); H01J 2237/186 (2013.01);
Abstract

A devicefor generating a controlled ionic flow I is described. The deviceis portable and comprises an ionization chamber, at least one inlet memberand at least one ion outlet member. The ionization chamberis suitable to be kept at a vacuum pressure, and configured to ionize gaseous particles contained therein. The at least one inlet memberis configured to inhibit or allow and/or adjust an inlet in the ionization chamber of a gaseous flow Fi of said gaseous particles. In addition, the at least one inlet membercomprises a gaseous flow adjusting interface, having a plurality of nano-holes, of sub-micrometric dimensions, suitable to be opened or closed, in a controlled manner, to inhibit or allow a respective plurality of gas micro-flows through the at least one inlet member


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