The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2019

Filed:

Mar. 23, 2016
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Min Zou, Niskayuna, NY (US);

Francis Johnson, Clifton Park, NY (US);

Patel Bhageerath Reddy, Niskayuna, NY (US);

James Pellegrino Alexander, Ballston Lake, NY (US);

Ayman Mohamed Fawzi EL-Refaie, Niskayuna, NY (US);

Wanming Zhang, Niskayuna, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01F 7/02 (2006.01); H01F 41/02 (2006.01); B05D 7/14 (2006.01); C23C 8/04 (2006.01); C23C 8/26 (2006.01); H01F 1/147 (2006.01); H02K 19/02 (2006.01); H02K 1/02 (2006.01); H02K 1/24 (2006.01); C22C 38/04 (2006.01); C22C 38/30 (2006.01); C22C 38/38 (2006.01); C21D 1/26 (2006.01);
U.S. Cl.
CPC ...
H01F 7/021 (2013.01); B05D 7/14 (2013.01); C22C 38/04 (2013.01); C22C 38/30 (2013.01); C22C 38/38 (2013.01); C23C 8/04 (2013.01); C23C 8/26 (2013.01); H01F 1/147 (2013.01); H01F 41/0253 (2013.01); H02K 1/02 (2013.01); H02K 1/246 (2013.01); H02K 19/02 (2013.01); C21D 1/26 (2013.01); C21D 2221/00 (2013.01);
Abstract

A magnetic component including at least one region is disclosed. The at least one region includes nitrogen and a concentration of the nitrogen in the at least one region is graded across a dimension of the at least one region. Further, a saturation magnetization in the at least one region is graded across the dimension of the at least one region. Further, a method of varying the magnetization values in at least one region of the magnetic component is disclosed.


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