The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2019

Filed:

Jan. 24, 2014
Applicants:

The Aerospace Corporation, El Segundo, CA (US);

Amendia Inc., Marietta, GA (US);

Inventors:

Frank Edward Livingston, Redondo Beach, CA (US);

Timothy Ganey, Tampa, FL (US);

Assignee:

The Aerospace Corporation, El Segundo, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/37 (2006.01); G05B 15/02 (2006.01); A61F 2/30 (2006.01);
U.S. Cl.
CPC ...
G05B 15/02 (2013.01); A61F 2/30771 (2013.01); A61F 2002/3097 (2013.01);
Abstract

A material modification assembly comprises an energy source for generating light beams to modify a substrate. A computing device generates pattern script(s) based on at least one parameter of the modification. The computing device also generates process script(s) including a type of pulse scripts to be used with the light beams and are based on at least one parameter of the interaction between the energy source and the substrate. The computing device combines the pattern script(s) with the process script(s) and generates command signals based on the combination. The computing device transmits the command signals to one or more additional devices of the material modification assembly to facilitate modifying the light beams for the modification to the substrate such that the modification includes a pattern on at least a surface of the substrate having dimensions and includes two or more discrete material alterations or changes spatially overlapped within the pattern.


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