The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2019

Filed:

Feb. 23, 2017
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Shinichiro Sonoda, Ashigarakami-gun, JP;

Tatsuya Yoshihiro, Ashigarakami-gun, JP;

Hiroki Takahashi, Ashigarakami-gun, JP;

Mototaka Kanaya, Sano, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/118 (2015.01); B32B 7/02 (2019.01); B32B 9/00 (2006.01); B32B 3/30 (2006.01); G02B 1/115 (2015.01); C23C 14/06 (2006.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01); G02B 27/00 (2006.01); C03C 17/34 (2006.01); C23C 14/00 (2006.01); C23C 14/58 (2006.01);
U.S. Cl.
CPC ...
G02B 1/118 (2013.01); B32B 3/30 (2013.01); B32B 7/02 (2013.01); B32B 9/00 (2013.01); C03C 17/3435 (2013.01); C23C 14/0036 (2013.01); C23C 14/0676 (2013.01); C23C 14/08 (2013.01); C23C 14/083 (2013.01); C23C 14/34 (2013.01); C23C 14/3464 (2013.01); C23C 14/58 (2013.01); G02B 1/115 (2013.01); G02B 27/0018 (2013.01); C03C 2217/734 (2013.01);
Abstract

The antireflection film is provided on a surface of a light-transmitting substrate and includes a thin multi-layer film and a fine unevenness layer that are laminated in this order from the substrate side. The thin multi-layer film includes multiple layers. The fine unevenness layer has a structure in which an uneven structure having a shorter average pitch than a wavelength of used light is provided and in which a refractive index to the used light changes continuously depending on a continuous change in a space occupation of the uneven structure in a thickness direction of the thin multi-layer film. The multiple layers include: an oxide film having a relatively high refractive index that is formed of at least two metal elements or is formed of silicon and at least one metal element; and an oxynitride film having a relatively low refractive index.


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