The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2019
Filed:
Nov. 28, 2014
Nanomakers, Rambouillet, FR;
François Tenegal, Paris, FR;
Adrien Reau, Montpellier, FR;
NANOMAKERS, Rambouillet, FR;
Abstract
A method for producing particles, includes the following steps: introducing into a reaction chamber at least one reaction flow including a first chemical element (typically silicon) and propagating in a flow direction; projecting a ray beam through the reaction chamber, intersecting each reaction flow in an reaction flow interaction area, in order to form, in each reaction flow, the cores of particles including the first chemical element, and introducing, in the reaction chamber, a second chemical element, interacting with each reaction flow in order to cover the cores of particles with a layer including the second chemical element. Each reaction flow is preferably free of an agent oxidizing the first chemical element.