The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2019
Filed:
Jul. 21, 2011
Hiromi Kiyose, Neyagawa, JP;
Satoru Hiraki, Neyagawa, JP;
Hiroshi Watanabe, Atsugi, JP;
Kurashiki Boseki Kabushiki Kaisha, Kurashiki, JP;
Chemical Art Technology, Inc., Atsugi, JP;
Abstract
A substrate processing device, which processes by immersing the substrate in the processing liquid comprising a mixture of a chemical and a diluting liquid, is provided with: a processing tank () that retains the processing liquid; heating means () that heat the processing liquid; a temperature detection means () that detects the temperature of the processing liquid; a temperature control means () that operates the aforementioned heating means () in a manner so that the detected temperature approaches a set temperature; a replenishing means () that replenishes the diluting liquid in the processing liquid; a concentration detection means () that detects the concentration of the processing liquid by measuring the light absorption characteristics of the processing liquid; and a concentration control means () that operates the aforementioned replenishing means () in a manner so that the detected concentration approaches a set concentration.