The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2019

Filed:

Oct. 16, 2015
Applicant:

Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;

Inventors:

Hisao Nagai, Osaka, JP;

Takafumi Okuma, Osaka, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B22F 9/14 (2006.01); C04B 35/626 (2006.01); C04B 35/14 (2006.01); C04B 35/111 (2006.01); C04B 35/573 (2006.01); C04B 35/591 (2006.01); C04B 35/628 (2006.01); B22F 1/00 (2006.01); C01F 7/02 (2006.01);
U.S. Cl.
CPC ...
B22F 9/14 (2013.01); C04B 35/111 (2013.01); C04B 35/14 (2013.01); C04B 35/573 (2013.01); C04B 35/591 (2013.01); C04B 35/62813 (2013.01); C04B 35/62834 (2013.01); B22F 1/0018 (2013.01); B22F 2999/00 (2013.01); C01F 7/023 (2013.01); C01P 2004/64 (2013.01); C04B 2235/5454 (2013.01);
Abstract

An apparatus and a method for producing fine particles capable of increasing the production and producing fine particles at low costs by feeding a large quantity of material efficiently into the plasma. The apparatus includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles into the vacuum chamber from material feeing ports, a plurality of electrodes connected to the vacuum chamber, tip ends of which protrude into the vacuum chamber to generate plasma and a collecting device connected to the vacuum chamber and collecting fine particles, which generates discharge inside the vacuum chamber and produces the fine particles from the material, in which the material feeding ports of the material feeding device are arranged in a lower side than the plural electrodes in the vertical direction in the vacuum chamber.


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