The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2019
Filed:
May. 01, 2017
Adobe Inc., San Jose, CA (US);
Byungmoon Kim, Sunnyvale, CA (US);
Daichi Ito, Los Gatos, CA (US);
Gahye Park, Santa Clara, CA (US);
Adobe Inc., San Jose, CA (US);
Abstract
In embodiments of facial feature liquifying using face mesh, an image processing application is implemented to modify facial features of a face in an image from a combination of deformation fields. The image processing application can generate a face mesh that includes landmark points, and then construct the deformation fields on the face mesh, where the deformation fields are defined by warpable elements formed from the landmark points. The image processing application can also combine the deformation fields. The image processing application can also receive an input to initiate modifying one or more of the facial features of the face in the image using the combined deformation fields.