The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2019
Filed:
Feb. 02, 2017
Applicant:
Toshiba Memory Corporation, Minato-ku, JP;
Inventors:
Masaki Mae, Yokkaichi, JP;
Suigen Kanda, Nagoya, JP;
Assignee:
TOSHIBA MEMORY CORPORATION, Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/50 (2012.01); G03F 1/60 (2012.01); G03F 1/70 (2012.01); G03F 1/76 (2012.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/26 (2006.01); G03F 7/095 (2006.01); H01L 21/027 (2006.01); H01L 21/311 (2006.01); H01L 27/11575 (2017.01); H01L 27/11582 (2017.01);
U.S. Cl.
CPC ...
G03F 1/50 (2013.01); G03F 1/60 (2013.01); G03F 1/70 (2013.01); G03F 1/76 (2013.01); G03F 7/095 (2013.01); G03F 7/16 (2013.01); G03F 7/2006 (2013.01); G03F 7/2008 (2013.01); G03F 7/2022 (2013.01); G03F 7/26 (2013.01); H01L 21/0274 (2013.01); H01L 21/31111 (2013.01); H01L 21/31144 (2013.01); H01L 27/11575 (2013.01); H01L 27/11582 (2013.01);
Abstract
A photomask according to the embodiment includes a glass substrate which has a first face and a second face located on a side opposite from the first face. The second face includes a transmission area and a light shielding area corresponding to an exposure pattern of a resist film exposed via the glass substrate. The transmission area is oblique to the first face.