The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2019

Filed:

Sep. 20, 2016
Applicant:

Olympus Corporation, Hachioji-shi, Tokyo, JP;

Inventors:

Akihiro Kitahara, Hino, JP;

Shintaro Kobayashi, Hachioji, JP;

Assignee:

OLYMPUS CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/00 (2006.01); G02B 21/16 (2006.01); G02B 5/00 (2006.01); G02B 21/24 (2006.01); G02B 21/02 (2006.01); G02B 21/08 (2006.01);
U.S. Cl.
CPC ...
G02B 21/0088 (2013.01); G02B 5/005 (2013.01); G02B 21/16 (2013.01); G02B 21/24 (2013.01); G02B 21/025 (2013.01); G02B 21/088 (2013.01);
Abstract

An inverted microscope includes: an epifluorescence illumination optical system configured to irradiate a specimen on a stage with epi-illumination light from below the stage; a transmitting illumination optical system configured to irradiate the specimen on the stage with transmitting illumination light from above the stage; an objective lens arranged below the stage and configured to collect the epi-illumination light on the specimen; and a light blocking unit configured to be arranged between the stage and the transmitting illumination optical system so as to be located on or deviated from an observation optical axis of the inverted microscope, and configured to be located at a light blocking position separated from the stage so as to block all direct light entering the objective lens at an angle not larger than an aperture angle of the objective lens.


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