The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2019

Filed:

Jan. 07, 2010
Applicants:

Yoichi Katsumoto, Tokyo, JP;

Shinji Omori, Tokyo, JP;

Inventors:

Yoichi Katsumoto, Tokyo, JP;

Shinji Omori, Tokyo, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/12 (2006.01); G01N 15/10 (2006.01); C40B 60/14 (2006.01);
U.S. Cl.
CPC ...
G01N 15/12 (2013.01); G01N 15/1031 (2013.01); G01N 15/1056 (2013.01); G01N 2015/1006 (2013.01); G01N 2015/1254 (2013.01);
Abstract

A flow channel device, a complex permittivity measuring apparatus, and a dielectric cytometry system are provided which can improve the measurement accuracy. A constriction portion having a constricted space is disposed between an inflow port and an outflow port of a flow channel. Electrodes are arranged between the inflow port and the constriction portion and between the outflow port and the constriction portion. The conductance of the constriction portion at a low-limit frequency is less than the combined conductance of an inflow channel portion and an outflow channel portion. The capacitance of the constriction portion at a high-limit frequency is less than the combined capacitance of the inflow channel portion and the outflow channel portion.


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