The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2019

Filed:

May. 15, 2017
Applicant:

Semiconductor Energy Laboratory Co., Ltd., Atsugi-shi, Kanagawa-ken, JP;

Inventors:

Shunpei Yamazaki, Tokyo, JP;

Kenichi Okazaki, Tochigi, JP;

Mitsuo Mashiyama, Tochigi, JP;

Takuya Handa, Tochigi, JP;

Masahiro Watanabe, Tochigi, JP;

Hajime Tokunaga, Kanagawa, JP;

Assignee:

Semiconductor Energy Laboratory Co., Ltd., Atsugi-shi, Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 27/24 (2006.01); H01L 29/786 (2006.01); G02F 1/1368 (2006.01); H01L 21/70 (2006.01); H01L 27/105 (2006.01); H01L 29/24 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 27/2418 (2013.01); G02F 1/1368 (2013.01); H01L 21/70 (2013.01); H01L 27/1052 (2013.01); H01L 27/1225 (2013.01); H01L 29/24 (2013.01); H01L 29/7869 (2013.01); H01L 29/78648 (2013.01); H01L 29/78693 (2013.01); H01L 51/50 (2013.01);
Abstract

Stable electrical characteristics of a transistor including an oxide semiconductor layer are achieved. A highly reliable semiconductor device including the transistor is provided. The semiconductor device includes a multilayer film formed of an oxide layer and an oxide semiconductor layer, a gate insulating film in contact with the oxide layer, and a gate electrode overlapping with the multilayer film with the gate insulating film interposed therebetween. The oxide layer contains a common element to the oxide semiconductor layer and has a large energy gap than the oxide semiconductor layer. The composition between the oxide layer and the oxide semiconductor layer gradually changes.


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