The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2019
Filed:
May. 31, 2017
Hrl Laboratories, Llc, Malibu, CA (US);
David F. Brown, Thousand Oaks, CA (US);
Keisuke Shinohara, Thousand Oaks, CA (US);
Miroslav Micovic, Thousand Oaks, CA (US);
Alexandros Margomenos, San Jose, CA (US);
Andrea Corrion, Oak Park, CA (US);
Hector L. Bracamontes, Lawndale, CA (US);
Ivan Alvarado-Rodriguez, Culver City, CA (US);
HRL Laboratories, LLC, Malibu, CA (US);
Abstract
Methods using chemical vapor deposition (CVD) of diamond deposited on a sacrificial material provide CVD diamond microchannel structures and 3-D interconnection structures of CVD diamond microfluidic channels. The sacrificial material is patterned to define locations and dimensions of the microchannels. The patterned sacrificial material is selectively removed from underneath the chemical vapor deposited (CVD) diamond to form the CVD diamond microchannels. The CVD diamond microchannels are integrated with electronic structures to provide an integral microfluidic cooling system to electronic devices.