The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2019

Filed:

Dec. 02, 2015
Applicant:

Nitto Denko Corporation, Ibaraki-shi, Osaka, JP;

Inventors:

Motoki Haishi, Ibaraki, JP;

Naoki Tsuno, Ibaraki, JP;

Assignee:

NITTO DENKO CORPORATION, Ibaraki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01B 5/14 (2006.01); H01B 3/42 (2006.01); H01B 1/02 (2006.01); B32B 27/08 (2006.01); B32B 27/36 (2006.01); B32B 27/32 (2006.01); B32B 7/02 (2006.01); H03K 17/96 (2006.01); G06F 3/044 (2006.01);
U.S. Cl.
CPC ...
H01B 5/14 (2013.01); B32B 7/02 (2013.01); B32B 27/08 (2013.01); B32B 27/325 (2013.01); B32B 27/36 (2013.01); B32B 27/365 (2013.01); G06F 3/044 (2013.01); H01B 1/02 (2013.01); H01B 3/426 (2013.01); H03K 17/962 (2013.01); B32B 2255/10 (2013.01); B32B 2305/38 (2013.01); B32B 2307/202 (2013.01); B32B 2307/412 (2013.01); B32B 2457/208 (2013.01); G06F 2203/04103 (2013.01); G06F 2203/04112 (2013.01); H03K 2217/960755 (2013.01);
Abstract

Provided are: a transparent electroconductive film with good transparency, wherein the transparent electroconductive film has antiblocking properties that can withstand roll-to-roll manufacturing, and white haze on the transparent electroconductive film side is reduced. Also provided is a touch sensor in which the transparent electroconductive film is used. This transparent electroconductive film includes a transparent substrateand a transparent electroconductive filmformed on one side of the transparent substrate, wherein the arithmetic mean surface roughness Ra in a 452×595 μm field of view on the surface of the transparent electroconductive filmis greater than 0 nm and no more than 10 nm, and the arithmetic mean surface roughness Ra in a 452×595 μm field of view on the surface of the transparent substrateon which the transparent electroconductive filmis not formed is greater than 5 nm and less than 100 nm.


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