The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2019
Filed:
May. 12, 2016
The Regents of the University of California, Oakland, CA (US);
Norman Rostoker, Oakland, CA (US);
Michl W. Binderbauer, Ladera Ranch, CA (US);
Eusebio Garate, Irvine, CA (US);
Vitaly Bystritskii, Irvine, CA (US);
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, Oakland, CA (US);
Abstract
A method of containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology. A magnetic guide field is created within a cylindrical chamber. The guide field has field lines axially extending within the chamber parallel to the longitudinal axis. A plasma of charged electron and ion particles is injected into the chamber. The plasma is caused to rotate, which forms a magnetic poloidal self-field surrounding the rotating plasma due to the current carried by the rotating plasma. The rotational energy of the plasma is increased to increase the magnitude of the self-field to a level that overcomes the magnetic guide field axially extending within the chamber, which causes the formation of a magnetic field within the chamber with FRC topology.