The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2019
Filed:
May. 21, 2015
Shenzhen Orbbec Co., Ltd., Shenzhen, Guangdong, CN;
Zhenzhong Xiao, Guangdong, CN;
Honghuai Xu, Guangdong, CN;
Long Liu, Guangdong, CN;
Yuanhao Huang, Guangdong, CN;
Shenzhen Orbbec Co., Ltd., Shenzhen, CN;
Abstract
The present invention relates to a human body model acquisition method and a virtual network fitting system based on depth cameras. The method includes the following steps: step S1: generating mark points covering a model body surface and used for determining features of the model body surface on the model body surface, meanwhile collecting depth images of the model body from a plurality of angles by using the depth cameras to acquire a depth image sequence that covers the model body surface and contains the mark points; step S2: carrying target depth information point cloud grid reconstruction on frames of depth images in the depth image sequence; and step S3: mosaicing the reconstructed frames of depth images into a three-dimensional model of the model body according to the mark points in the reconstructed frames of depth images. Compared with the prior art, by adopting the human body model acquisition method and the virtual network fitting system based on the depth cameras provided by the present invention, the accurate three-dimensional human body model and the accurate three-dimensional garment model can be acquired, and virtual fitting is carried out accordingly to acquire a real fitting effect.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile