The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2019
Filed:
Feb. 02, 2016
Canon Kabushiki Kaisha, Tokyo, JP;
Kazuki Nakagawa, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides an imprint method of forming a pattern on a shot region formed on a substrate by using a mold having a pattern region, the method comprising performing control for deformation of at least one of the pattern region and the shot region in accordance with a deformation amount, obtaining a shift amount between each of a plurality of marks provided on the pattern region and a corresponding one of a plurality of marks provided, on the shot region after the deformation, selecting marks to be used for controlling an overlay between the pattern region and the shot region so as to satisfy a preset condition based on the shift amounts, and performing feedback control for the overlay based on detection results on positions of the selected marks, after the deformation in the performing control for deformation.