The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10216092 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 26, 2019

Filed:

Jan. 06, 2017
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Haruna Kawashima, Haga-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); G02B 19/00 (2006.01); G02B 17/06 (2006.01); G02B 5/10 (2006.01); G02B 5/09 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70175 (2013.01); G02B 5/10 (2013.01); G02B 17/0657 (2013.01); G02B 19/0019 (2013.01); G02B 19/0023 (2013.01); G02B 19/0047 (2013.01); G02B 19/0095 (2013.01); G03F 7/702 (2013.01); G03F 7/7015 (2013.01); G03F 7/7085 (2013.01); G03F 7/70141 (2013.01); G02B 5/09 (2013.01);
Abstract

A light source apparatus including a light source configured to emit a light flux from an emission region having a predetermined size and a rotationally symmetrical emission intensity distribution; and a condenser configured to condense the light flux to allow the light flux to exit to the outside. The condenser is rotationally symmetrical about an optical axis and is disposed to surround the emission region, and has four or more reflection mirrors each having a reflecting surface for reflecting the light flux emitted from the emission region. The reflection mirrors include elliptical surface reflection mirrors where the reflecting surface is elliptical and spherical surface reflection mirrors where the reflecting surface is spherical, and are alternately arranged in the direction of the optical axis, and a light flux reflected by one spherical surface reflection mirror is further reflected by one elliptical surface reflection mirror oppositely disposed across the emission region.


Find Patent Forward Citations

Kawashima, Haruna. (2019). Light source apparatus, illumination device, exposure apparatus, and device manufacturing method (U.S. Patent No. 10216092). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10216092

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