The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2019
Filed:
May. 23, 2017
Fujifilm Corporation, Tokyo, JP;
Naoharu Kiyoto, Shizuoka, JP;
Yuki Nakagawa, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
An infrared reflective patterned product includes an infrared reflective pattern portion which has an infrared reflective material in a region constituting at least a part of a support. The infrared reflective pattern portion has an uneven structure which includes a plurality of protruding or recessed portions. Metal particles are contained on surfaces of the protruding or recessed portions. The particles include 60 number-percent or greater of tabular metal particles in a hexagonal or circular shape, and the tabular particles which are plane-oriented so that an angle between a principal plane of the particle and a surface of the uneven structure closest to the particle is in a range of 0° to ±30° are adjusted to be 50 number-percent or greater of all tabular metal particles. In the patterned product, the ratio of the reflectance of the infrared reflective pattern portion at a wavelength with the highest reflectance in an infrared region of 780 nm to 2500 nm to the reflectance of a non-pattern portion is large in a case where the infrared reflective pattern portion is obliquely irradiated with infrared rays.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile