The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2019
Filed:
Oct. 15, 2014
Applicant:
The Board of Trustees of the University of Illinois, Urbana, IL;
Inventors:
Christos G. Takoudis, Chicago, IL (US);
Manish Singh, Chicago, IL (US);
Sathees Kannan Selvaraj, Chicago, IL (US);
Assignee:
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/52 (2006.01); C23C 16/455 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 16/406 (2013.01); C23C 16/45523 (2013.01); C23C 16/45544 (2013.01); C23C 16/45553 (2013.01); C23C 16/45561 (2013.01);
Abstract
A deposition system can conduct ALD or CVD deposition and can switch between the deposition modes. The system is capable of depositing multi-metal films and multi-layer films of alternating ALD and CVD films. Reactant supplies can be bypassed with carrier gas flow to maintain pressure in a reactor and in reactor supply lines and purge reactants.
Takoudis, Christos. (2019). Multi-metal films, alternating film multilayers, formation methods and deposition system (U.S. Patent No. 10214817). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10214817
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile