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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10214808 B1

PDFFull Text
Date of Patent:
Feb. 26, 2019

Filed:

Apr. 20, 2017

Deposition apparatus

Applicant:

Samsung Display Co., Ltd., Yongin-si, Gyeonggi-do, KR;

Inventors:

Myung-Soo Huh, Yongin-si, KR;

Suk-Won Jung, Yongin-si, KR;

Jeong-Ho Yi, Yongin-si, KR;

Sang-Hyuk Hong, Yongin-si, KR;

Yong-Suk Lee, Yongin-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin, Gyeonggi-do, KR;

Attorney:

Lee & Morse, P.C.

Primary Examiner:

Robert A Vetere

Int. Cl.
CPC ...
H01L 27/00 (2006.01); C23C 16/04 (2006.01); C23C 16/458 (2006.01); H01L 21/68 (2006.01); H01L 27/32 (2006.01); H01L 21/687 (2006.01); C23C 16/44 (2006.01); C23C 16/50 (2006.01); C23C 16/52 (2006.01); H01L 51/00 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/042 (2013.01); C23C 16/4405 (2013.01); C23C 16/4585 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01); H01L 21/681 (2013.01); H01L 21/682 (2013.01); H01L 21/68735 (2013.01); H01L 21/68742 (2013.01); H01L 27/3244 (2013.01); H01L 51/0012 (2013.01); H01L 51/56 (2013.01);
Abstract

A deposition apparatus for performing a deposition process by using a mask with respect to a substrate, the deposition apparatus includes a chamber, a support unit in the chamber, the support unit including first holes and being configured to support the substrate, a supply unit configured to supply at least one deposition raw material toward the substrate, and movable alignment units through the first holes of the support unit, the alignment units being configured to support the mask and to align the mask with respect to the substrate.

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