The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 19, 2019

Filed:

Dec. 20, 2016
Applicant:

Lpe S.p.a., Baranzate (MI), IT;

Inventors:

Vincenzo Ogliari, Baranzate, IT;

Francesco Corea, Baranzate, IT;

Franco Preti, Baranzate, IT;

Assignee:

LPE S.P.A., Baranzate (MI), IT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); B25J 15/06 (2006.01); C23C 16/458 (2006.01); C30B 25/12 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6838 (2013.01); B25J 15/0616 (2013.01); C23C 16/4582 (2013.01); C30B 25/12 (2013.01);
Abstract

The tool () for manipulating substrates in an epitaxial reactor comprises an arm (), a gripping disc () and a ball joint (); said gripping disc () has a seat () on a lower face thereof for receiving a substrate () to be manipulated; said gripping disc () is mounted on the arm () through said ball joint () placed centrally with respect to said gripping disc (); said gripping disc () is shaped so as to come into contact only with the upper edge of said substrate () to be manipulated; said gripping disc () has two degrees of freedom of rotational movement with respect to said arm () to allow adapting to the position of a substrate in a pocket of a susceptor of an epitaxial reactor.


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