The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 19, 2019

Filed:

Jan. 27, 2017
Applicant:

Agilent Technologies, Inc., Santa Clara, CA (US);

Inventors:

Yoichi Nagata, Tokyo, JP;

Shusaku Tsuruga, Kanagawa-Ken, JP;

Takeo Kuwabara, Tokyo, JP;

Ryosuke Tobiyama, Tokyo, JP;

Assignee:

Agilent Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/04 (2006.01); H01J 49/10 (2006.01);
U.S. Cl.
CPC ...
H01J 49/0422 (2013.01); H01J 49/105 (2013.01);
Abstract

To achieve an effective gas filtering in a plasma spectrometric apparatus using a gas of a comparatively high consumption flow rate, and to improve the analytical ability, there is provided a plasma spectrometric apparatus containing a sample introducer for producing and delivering an injector gas containing an analyte sample, a plasma generator for generating plasma into which the injector gas is introduced, and an analyzer disposed subsequent to the plasma generator for analyzing the analyte sample. The plasma spectrometric apparatus contains a first gas line for supplying gas to the sample introducer, a second gas line for supplying gas to the plasma generator, and a filter located in the first gas line for removing impurities contained in the gas.


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