The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2019
Filed:
Sep. 16, 2014
Swisslitho Ag, Zürich, CH;
International Business Machines Corporation, Armonk, NY (US);
Felix Holzner, Zürich, CH;
Michael Zientek, Zürich, CH;
Philip Paul, Adliswil, CH;
Armin Knoll, Adliswil, CH;
Colin Rawlings, Rüschlikon, CH;
SwissLitho AG, Zurich, CH;
Abstract
A scanning probe nanolithography system comprising a probe to create nanostructures line () by line through writing said nanostructures () pixel by pixel along lines () on a sample. A positioning system is adapted to provide a positioning of the probe at a sequence of predetermined positions to the sample and its surface towards the probe and a control unit () is provided to control the positioning system for positioning the probe for a pixel-wise writing of said lines () through a writing unit. It further comprises a sensor unit adapted to detect a predetermined property of the written nanostructure (), the sensor unit being connected to the control unit to adapt the control signals to be provided to the writing unit for writing the following line () based on the measured signals () of the predetermined property.