The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 19, 2019

Filed:

Feb. 24, 2014
Applicant:

Mitsubishi Electric Corporation, Chiyoda-ku, Tokyo, JP;

Inventors:

Toshikatsu Arai, Tokyo, JP;

Hitoshi Kikuchi, Tokyo, JP;

Tsutomu Takahashi, Tokyo, JP;

Tatsushi Murakami, Tokyo, JP;

Assignee:

MITSUBISHI ELECTRIC CORPORATION, Chiyoda-Ku, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F04D 29/66 (2006.01); F04D 19/00 (2006.01); F04D 29/32 (2006.01); F04D 29/38 (2006.01);
U.S. Cl.
CPC ...
F04D 29/666 (2013.01); F04D 19/002 (2013.01); F04D 29/329 (2013.01); F04D 29/384 (2013.01); F05D 2240/303 (2013.01); F05D 2240/304 (2013.01);
Abstract

An axial flow fan improves air capacity and static pressure characteristics, and can ease stress at a leading edge portion of a blade base, even when a shape for noise reduction is adopted. An axial flow fan includes a boss portion and rotor blades. A rotor blade is segmented into a first area extending from the boss portion toward the outer peripheral side, and a second area connected to the first area and extending from the first area to the outermost periphery of the rotor blade. The distribution of a forward sweep angle varies quadratically in the first area, and the maximum forward sweep angle in the first area is not larger than the forward sweep angle in the second area. The distribution of chord-pitch ratio varies in a curved manner from the base as the minimum value in the first area, and is linear in the second area.


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