The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 19, 2019

Filed:

Aug. 08, 2016
Applicant:

Ushio Denki Kabushiki Kaisha, Tokyo, JP;

Inventors:

Keisuke Naito, Tokyo, JP;

Nobuyuki Hishinuma, Tokyo, JP;

Shinji Suzuki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61L 9/00 (2006.01); C01B 13/10 (2006.01); C01B 13/11 (2006.01); A61L 2/20 (2006.01); A61L 2/26 (2006.01); A61L 9/04 (2006.01); A61L 9/12 (2006.01);
U.S. Cl.
CPC ...
C01B 13/10 (2013.01); A61L 2/202 (2013.01); A61L 2/26 (2013.01); A61L 9/046 (2013.01); A61L 9/12 (2013.01); C01B 13/11 (2013.01);
Abstract

The present invention has as its object the provision of an ozone generator that can generate ozone with high efficiency. The ozone generator of the present invention includes: source gas supply means for supplying a source gas containing oxygen; a gas flow channel forming member for forming a gas flow channel through which the source gas from the source gas supply means flows; and an ultraviolet light source for emitting ultraviolet light, the ultraviolet light source being disposed in the gas flow channel. The ozone generator irradiates the source gas flowing through the gas flow channel with the ultraviolet light from the ultraviolet light source to cause the oxygen in the source gas to absorb the ultraviolet light and thereby generate ozone. The ultraviolet light source comprises an excimer lamp for emitting ultraviolet light with a wavelength of not more than 200 nm. A flow rate of the source gas in a region where the ultraviolet light source is disposed in the gas flow channel is not lower than 0.1 m/s.


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