Manufacturing method for light barrier substrate

Abstract

The present invention provides a manufacturing method for a light barrier substrate which comprising steps of: forming a metal electrode pattern on a substrate through a first patterning process; forming an insulating layer above the substrate and the metal electrode pattern; forming a metal electrode via hole on the insulating layer and forming a channel pattern for a connecting line between a metal electrode and an exterior integrated circuit (IC) on the insulating layer, with a half tone make process, through a second patterning process; forming a transparent electrode layer pattern on the substrate on which the metal electrode via hole and the channel pattern are formed. The masking steps for forming the insulating layer and the transparent electrode layer may be decreased due to the half tone masking process, thus, the manufacturing process is simplified and the manufacturing efficiency is increased, and the cost for manufacturing the light barrier substrate is lowered because the mask is less used in the manufacturing process.