The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2019

Filed:

Sep. 22, 2015
Applicant:

Alta Devices, Inc., Sunnyvale, CA (US);

Inventors:

Thomas Gmitter, Sunnyvale, CA (US);

Gang He, Cupertino, CA (US);

Melissa Archer, San Jose, CA (US);

Andreas Hegedus, Burlingame, CA (US);

Assignee:

ALTA DEVICES, INC., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H01L 21/78 (2006.01); H01L 21/67 (2006.01); H01L 21/306 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 21/7813 (2013.01); H01L 21/30612 (2013.01); H01L 21/67086 (2013.01); H01L 21/67092 (2013.01); H01L 21/67132 (2013.01); H01L 21/6835 (2013.01); H01L 21/6836 (2013.01); H01L 31/184 (2013.01); H01L 2221/6839 (2013.01); H01L 2221/68318 (2013.01); H01L 2221/68345 (2013.01); H01L 2221/68381 (2013.01);
Abstract

Embodiments of the invention generally relate to apparatuses and methods for producing epitaxial thin films and devices by epitaxial lift off (ELO) processes. In one embodiment, a method for forming thin film devices during an ELO process is provided which includes coupling a plurality of substrates to an elongated support tape, wherein each substrate contains an epitaxial film disposed over a sacrificial layer disposed over a wafer, exposing the substrates to an etchant during an etching process while moving the elongated support tape, and etching the sacrificial layers and peeling the epitaxial films from the wafers while moving the elongated support tape. Embodiments also include several apparatuses, continuous-type as well as a batch-type apparatuses, for forming the epitaxial thin films and devices, including an apparatus for removing the support tape and epitaxial films from the wafers on which the epitaxial films were grown.


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