The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2019

Filed:

Jan. 12, 2017
Applicant:

Renesas Electronics Corporation, Koutou-ku, Tokyo, JP;

Inventors:

Tamotsu Ogata, Tokyo, JP;

Tatsuyoshi Mihara, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); H01L 21/3105 (2006.01); H01L 21/311 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/792 (2006.01); H01L 27/1157 (2017.01); H01L 27/11573 (2017.01); H01L 29/49 (2006.01); H01L 29/51 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28282 (2013.01); H01L 21/31051 (2013.01); H01L 21/31105 (2013.01); H01L 21/31144 (2013.01); H01L 27/1157 (2013.01); H01L 27/11573 (2013.01); H01L 29/42344 (2013.01); H01L 29/66545 (2013.01); H01L 29/66553 (2013.01); H01L 29/66833 (2013.01); H01L 29/792 (2013.01); H01L 29/4966 (2013.01); H01L 29/517 (2013.01); H01L 29/665 (2013.01);
Abstract

Over a semiconductor substrate, a memory gate electrode for a nonvolatile memory cell is formed via a first insulating film having an internal charge storage portion. A dummy control gate electrode is formed so as to be adjacent to the memory gate electrode via a second insulating film. The memory and the dummy control gate electrodes are made of different materials. A third insulating film is formed so as to cover the memory and the dummy control gate electrodes and then polished to expose the memory and the dummy control gate electrodes. Then, etching is performed under a condition in which the memory gate electrode is less likely to be etched than the dummy control gate electrode to remove the dummy control gate electrode. Then, in a trench as a region from which the dummy control gate electrode is removed, a control gate electrode for the memory cell is formed.


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