The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2019

Filed:

Jul. 01, 2017
Applicant:

Adshir Ltd., Shdema, IL;

Inventors:

Reuven Bakalash, Shdema, IL;

Amit Porat, Tel Aviv, IL;

Elad Haviv, Tel Aviv, IL;

Assignee:

ADSHIR LTD., Shdema, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/20 (2011.01); G06T 15/06 (2011.01); G06T 15/00 (2011.01); G06T 15/04 (2011.01); G06T 19/00 (2011.01);
U.S. Cl.
CPC ...
G06T 15/06 (2013.01); G06T 15/005 (2013.01); G06T 15/04 (2013.01); G06T 19/006 (2013.01);
Abstract

The present disclosure describes a new global illumination ray tracing, concentrated at augmented objects of virtual or augmented reality, utilizing the graphics pipeline. Secondary rays are handled in large groups, originating at clusters of primary hit points, and intersecting with scene geometry.


Find Patent Forward Citations

Bakalash, Reuven. (2019). System for ray tracing augmented objects (U.S. Patent No. 10204442). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10204442

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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