The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2019

Filed:

Jan. 06, 2014
Applicant:

Philips Gmbh, Hamburg, DE;

Inventors:

Michel Paul Jurriaan Jurrissen, Eindhoven, NL;

Johan Michiel Den Harder, Eindhoven, NL;

Ulrike Andrea Blume, Eindhoven, NL;

Elwin De Weerdt, Eindhoven, NL;

Gerrit Hendrik Van Ijperen, Eindhoven, NL;

Assignee:

KONINKLIJKE PHILIPS N.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 33/565 (2006.01); G01R 33/44 (2006.01); G01R 33/28 (2006.01); G01R 33/561 (2006.01);
U.S. Cl.
CPC ...
G01R 33/5659 (2013.01); G01R 33/288 (2013.01); G01R 33/445 (2013.01); G01R 33/5611 (2013.01); G01R 33/5615 (2013.01); G01R 33/56536 (2013.01); G01R 33/56563 (2013.01);
Abstract

The invention relates to a method of MR imaging near metal parts using SEMAC. It is an object of the invention to provide an improved MR imaging technique that is sufficiently fast and robust against susceptibility effects. The invention proposes to apply a weaker slice-selection magnetic field gradient (G) for reduction of ripple-artefacts near metal parts or to apply undersampling in the slice-selection direction of the SEMAC sequence or to apply both these aspects. According to one aspect of the invention, a sparsity constraint is used to make the reconstruction of the undersampled MR images more stable. Moreover, the invention relates to a MR device () and to a computer program to be run on a MR device ().


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