The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2019
Filed:
Jun. 13, 2016
California Institute of Technology, Pasadena, CA (US);
Haowen Ruan, Pasadena, CA (US);
Mooseok Jang, Pasadena, CA (US);
Changhuei Yang, South Pasadena, CA (US);
Daifa Wang, Pasadena, CA (US);
CALIFORNIA INSTITUTE OF TECHNOLOGY, Pasadena, CA (US);
Abstract
A method for irradiating scattering medium, including modifying a particle's response to electromagnetic radiation irradiating the particle in a scattering medium, wherein the electromagnetic radiation is scattered by the scattering medium, and modulated by the modifying, into scattered electromagnetic radiation comprising a scattered field; forming a phase conjugate field, wherein the phase conjugate field is a phase conjugate of the scattered field; and irradiating the scattering medium with the phase conjugate field, wherein the phase conjugate field forms a focus at a target defined by the particle.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile