The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2019
Filed:
Jun. 07, 2013
Regents of the University of Minnesota, Minneapolis, MN (US);
Dow Global Technologies Llc, Midland, MI (US);
Phillip Dene Hustad, Watertown, MA (US);
Frank Steven Bates, Saint Louis Park, MN (US);
Marc Andrew Hillmyer, Minneapolis, MN (US);
Justin Glenn Kennemur, Minneapolis, MN (US);
REGENTS OF THE UNIVERSITY OF MINNESOTA, Minneapolis, MN (US);
DOW GLOBAL TECHNOLOGIES LLC, Midland, MI (US);
Abstract
Disclosed herein is a block copolymer comprising a first block derived from a cyclo-alkyl vinyl monomer, a hydrogenated vinyl aromatic polymer or a hydrogenated vinyl pyridine polymers; and a second block derived from an acrylate monomer. Disclosed herein too is a method comprising reacting a first block derived from a cyclo-alkyl vinyl monomer, a hydrogenated vinyl aromatic polymer or a hydrogenated vinyl pyridine polymers with an initiator to form a macroinitiator; and polymerizing a second block onto the first block to form a block copolymer; where the second block is derived by polymerizing an acrylate monomer; and where the block copolymer has a chi parameter of greater than or equal to about 0.05, when measured at a temperature of 200° C. to 210° C.; where the chi parameter is a measure of interactions between the first block and the second block of the copolymer.